Development status of EUVL mask blank and substrateHIRABAYASHI, Yusuke.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663T.1-81663T.6, 2Conference Paper

19th annual symposium on photomask technology (Monterey CA, 15-17 September 1999)Abboud, Frank E; Grenon, Brian J.SPIE proceedings series. 1999, isbn 0-8194-3468-X, 2Vol, XV, 1022 p, isbn 0-8194-3468-XConference Proceedings

Photomask technology 2011 (19-22 September 2011, Monterey, California, United States)Maurer, Wilhelm; Abboud, Frank E.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 2 vol, 2, isbn 978-0-8194-8791-9Conference Proceedings

Accurate prediction of 3D mask topography induced best focus variation in full-chip photolithography applicationsPENG LIU.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816640.1-816640.8, 2Conference Paper

Mask Cycle Time Reduction for Foundry ProjectsBALASINSKI, A.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660K.1-81660K.8, 2Conference Paper

Challenges associated with advanced mask cleaningGRENON, Brian J.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661K.1-81661K.11, 2Conference Paper

Through-focus image balancing of alternating phase shifting masksSONG PENG.SPIE proceedings series. 1999, pp 328-336, isbn 0-8194-3468-X, 2VolConference Paper

Application of signal reconstruction techniques to shot count reduction in simulation driven fracturingSHANGLIANG JIANG; ZAKHOR, Avideh.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660U.1-81660U.14, 2Conference Paper

Challenges for 1X nm Device Fabrication using EUVL: Scanner and MaskARNOLD, William H.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81662I.1-81662I.9, 2Conference Paper

Mask Industry Assessment: 2011CHAN, Y. David.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660D.1-81660D.13, 2Conference Paper

18th annual symposium on photomask technology and management (Redwood City CA, 16-18 September 1998)Grenon, Brian J; Abboud, Frank E.SPIE proceedings series. 1998, isbn 0-8194-3007-2, XIII, 672 p, isbn 0-8194-3007-2Conference Proceedings

Extending CO₂ Cryogenic Aerosol Cleaning for Advanced Optical and EUV Mask CleaningVARGHESE, Ivin; BOWERS, Charles W; BALOOCH, Mehdi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 816615.1-8166185.13, 2Conference Paper

Yield optimization through MLR techniquesPHILIPPE, Morey-Chaisemartin; BEISSER, Eric.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663H.1-81663H.4, 2Conference Paper

Novel high-speed approach for CD uniformity mapping and monitoringHEMAR, S; SADE, A; FANDRICH, J et al.SPIE proceedings series. 1999, pp 203-208, isbn 0-8194-3468-X, 2VolConference Paper

Method to devise multi-phase complex mask in sub-micron lithographyXIANGANG LUO; HANMIN YAO.SPIE proceedings series. 1999, pp 987-994, isbn 0-8194-3468-X, 2VolConference Paper

Half multiphase printing : a proposed throughput improvement on MEBES 4500^<TM>SHEN, W. P.SPIE proceedings series. 1998, pp 358-360, isbn 0-8194-3007-2Conference Paper

Pellicle transmission uniformity requirementsBROWN, T; ITO, K.SPIE proceedings series. 1998, pp 409-412, isbn 0-8194-3007-2Conference Paper

Electron beam EUV patterned mask inspection systemYARNADA, Keizo; KITAYAMA, Yasunobu; FIEKOWSKY, Peter et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81662W.1-81662W.6, 2Conference Paper

Options for at-wavelength inspection of patterned extreme ultraviolet lithography masksTEJNIL, E; STIVERS, A.SPIE proceedings series. 1999, pp 792-803, isbn 0-8194-3468-X, 2VolConference Paper

Control methodology of off-target for varying pattern densities with chrome dry etchHOCHMUTH, J; RUHL, G; COLEMAN, T et al.SPIE proceedings series. 1999, pp 297-306, isbn 0-8194-3468-X, 2VolConference Paper

Detecting CD error or transmission error of photomask patternsYAMASHITA, K.SPIE proceedings series. 1998, pp 146-153, isbn 0-8194-3007-2Conference Paper

Bottlenecks in Data Preparation Flow for Multi-beam Direct WriteHUNG, Dan; MEIJER, Otto; ZEPKA, Alex et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81662C.1-81662C.11, 2Conference Paper

Phase defect analysis with actinic full-field EUVL mask blank inspectionYAMANE, Takeshi; TANAKA, Toshihiko; TERASAWA, Tsuneo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81660G.1-81660G.8, 2Conference Paper

The Impact of a Thinner Binary Mask Absorber on 22 nm and Beyond Mask Inspectability and Defect SensitivityBADGER, Karen D; SEKI, Kazunori.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661Y.1-81661Y.12, 2Conference Paper

Towards the Prediction of Pattern Collapse Hotspots for FullChip LayoutsSTURTEVANT, John L; DAVE, Aasutosh; HOLLERBACH, Uwe et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663Y.1-81663Y.8, 2Conference Paper